Download Chemical Solution Deposition of Semiconductor Films by Gary Hodes PDF

By Gary Hodes

Discussing particular depositions of a variety of semiconductors and houses of the ensuing motion pictures, "Chemical answer Deposition of Semiconductor motion pictures" examines the tactics concerned and explains the impression of assorted strategy parameters on ultimate movie and movie deposition results by utilizing distinct examples. providing experimental effects and functional examples, the booklet covers primary clinical rules underlying the chemical deposition technique, numerous mechanisms concerned about deposition, motion pictures of all of the semiconductors deposited via this system, and using semiconductor motion pictures in photovoltaics, photoelectrochemical homes, and measurement quantization results.

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This is due to interaction between polymer chains on the interacting particles: As the particles approach each other to the point where the polymer chains of the two particles interact, there is an decrease in entropy due to confinement of the chains, in an analogous manner to the solution species discussed earlier, with the same result—repulsion. This is the basis of polymeric stabilization of colloids; it is generally undesirable in CD, since adhesion and aggregation are preferred in this case.

All Rights Reserved. 1 A (BRIEF) HISTORY OF CHEMICAL DEPOSITION Chemical deposition (CD) of films is not a new technique. As early as 1835, Liebig reported the first deposition of silver—the silver mirror deposition—using a chemical solution technique [1]. The first reported CD of a compound semiconductor film appears to be formation of “lüsterfarben” (lustrous colors) on various metals from thiosulphate solutions of lead acetate, copper sulphate, and antimony tartrate, giving films of PbS, Cu-S or Sb-S, which possessed “splendid” colors (interference colors resulting from various thicknesses of the deposited films) [2].

2␥, where ␥ is the surface energy of the Copyright © 2002 by Marcel Dekker, Inc. All Rights Reserved. FIG. 4 Resultant interaction energy between two particles with van der Waals attractive interactions and electron overlap repulsion interactions. solid. 42) Substituting Eq. 42) into Eq. 43) This relation is clearly very simplified, being based on a number of approximations, such as the validity of the use of the Hamaker constant at such close distances and the particle and surface being of the same material.

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